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  <title>DSpace Collection:</title>
  <link rel="alternate" href="http://archives.univ-biskra.dz/handle/123456789/2167" />
  <subtitle />
  <id>http://archives.univ-biskra.dz/handle/123456789/2167</id>
  <updated>2026-04-06T17:43:43Z</updated>
  <dc:date>2026-04-06T17:43:43Z</dc:date>
  <entry>
    <title>Modeling the effect of defects on the performance of an n-CdO/p-Si solar cell</title>
    <link rel="alternate" href="http://archives.univ-biskra.dz/handle/123456789/7364" />
    <author>
      <name>S. Chala</name>
    </author>
    <author>
      <name>N. Sengouga</name>
    </author>
    <author>
      <name>F. Yakuphanoglu</name>
    </author>
    <id>http://archives.univ-biskra.dz/handle/123456789/7364</id>
    <updated>2019-05-06T11:54:04Z</updated>
    <published>2016-03-03T00:00:00Z</published>
    <summary type="text">Titre: Modeling the effect of defects on the performance of an n-CdO/p-Si solar cell
Auteur(s): S. Chala; N. Sengouga; F. Yakuphanoglu
Résumé: The interest in the study of Cadmium oxide (CdO) for photonic applications has&#xD;
increased significantly because of its promising electrical and optical properties. Real&#xD;
solar cells based on an n-CdO/p-Si heterostructures show poor photovoltaic&#xD;
performance, however. In this work numerical simulation is used to elucidate this poor&#xD;
performance by considering two cases. CdO is firstly considered as a perfect crystalline&#xD;
semiconductor. The second case models CdO as a semiconductor with continuous&#xD;
distribution of defects states in its band gap, similar to an amorphous semiconductor,&#xD;
made of two tail bands (a donor-like and an acceptor-like) and two Gaussian&#xD;
distribution deep level bands (an acceptor-like and a donor-like). Evidently the first&#xD;
case produced results far from reality. In the second case, however, and by adjusting&#xD;
the constituents of the band gap states the open circuit voltage (VOC) and the short&#xD;
circuit current (JSC) were almost perfectly reproduced but not the fill factor (FF) and the&#xD;
conversion efficiency (η). The p-type doping of Silicon adjustment has lead to a better&#xD;
reproduction of the two latter parameters.</summary>
    <dc:date>2016-03-03T00:00:00Z</dc:date>
  </entry>
  <entry>
    <title>Optimization of Optical Gain in Inx Ga1-xSb/GaSb unstrained quantum well structures</title>
    <link rel="alternate" href="http://archives.univ-biskra.dz/handle/123456789/7363" />
    <author>
      <name>Said Dehimi</name>
    </author>
    <author>
      <name>Aissat Abdelkader</name>
    </author>
    <author>
      <name>Djamel Haddad</name>
    </author>
    <author>
      <name>Lakhdar Dehimi</name>
    </author>
    <id>http://archives.univ-biskra.dz/handle/123456789/7363</id>
    <updated>2019-05-06T11:57:08Z</updated>
    <published>2016-03-03T00:00:00Z</published>
    <summary type="text">Titre: Optimization of Optical Gain in Inx Ga1-xSb/GaSb unstrained quantum well structures
Auteur(s): Said Dehimi; Aissat Abdelkader; Djamel Haddad; Lakhdar Dehimi
Résumé: n this paper we study the effects of In concentration, temperature, quantum well width and carrier density on optical gain for&#xD;
GaSb/InxGa1-xSb/GaSb untrained quantum well structures. This system was chosen as it is useful in infrared emission, finally, we&#xD;
introduce the optimum structure of quantum well to obtain the maximum optical gain, at room temperature and infrared emission&#xD;
particularly 2.3 (μm), for the use this structure in application of spectroscopic analysis of the gases specially CH4. This structure&#xD;
can be used for light absorption to increase the solar cell efficiency a based on a quantum well and multi-junction.</summary>
    <dc:date>2016-03-03T00:00:00Z</dc:date>
  </entry>
  <entry>
    <title>SMALL-SIGNAL TIME-DOMAIN PHYSICAL/ELECTRICAL FET MODELING APPROACH</title>
    <link rel="alternate" href="http://archives.univ-biskra.dz/handle/123456789/7362" />
    <author>
      <name>N.A. Abdeslam</name>
    </author>
    <author>
      <name>S. Asadi</name>
    </author>
    <author>
      <name>N. Sengouga</name>
    </author>
    <author>
      <name>M.C.E. Yagoub</name>
    </author>
    <id>http://archives.univ-biskra.dz/handle/123456789/7362</id>
    <updated>2019-05-06T11:54:01Z</updated>
    <published>2016-03-03T00:00:00Z</published>
    <summary type="text">Titre: SMALL-SIGNAL TIME-DOMAIN PHYSICAL/ELECTRICAL FET MODELING APPROACH
Auteur(s): N.A. Abdeslam; S. Asadi; N. Sengouga; M.C.E. Yagoub
Résumé: In this paper, a reliable small-signal time-domain FET&#xD;
modeling approach is proposed. Based on physical/electrical&#xD;
parameters, the proposed model can efficiently characterize&#xD;
high-frequency transistors.</summary>
    <dc:date>2016-03-03T00:00:00Z</dc:date>
  </entry>
  <entry>
    <title>Numerical simulation of bias and photo stress on indium-gallium-zinc-oxide thin film transistors</title>
    <link rel="alternate" href="http://archives.univ-biskra.dz/handle/123456789/7361" />
    <author>
      <name>M. Adaika</name>
    </author>
    <author>
      <name>Af Meftah</name>
    </author>
    <author>
      <name>N. Sengouga</name>
    </author>
    <author>
      <name>M. Henini</name>
    </author>
    <id>http://archives.univ-biskra.dz/handle/123456789/7361</id>
    <updated>2019-05-06T11:55:44Z</updated>
    <published>2016-03-03T00:00:00Z</published>
    <summary type="text">Titre: Numerical simulation of bias and photo stress on indium-gallium-zinc-oxide thin film transistors
Auteur(s): M. Adaika; Af Meftah; N. Sengouga; M. Henini
Résumé: Thin Film Transistors based on amorphous Indium-Gallium-Zinc-Oxide (a-IGZO&#xD;
TFT) are receiving a great deal of attention for their numerous applications as&#xD;
alternatives for amorphous and poly-crystalline Silicon based TFTs. A major concern&#xD;
about a-IGZO TFTs is that they suffer from instabilities when subjected to different&#xD;
types of stress (bias, light, etc...). Stress is believed to create defects of different kinds&#xD;
in different regions of the device. The instability manifests as a shift in the threshold&#xD;
voltage or a hump in the transfer characteristics of the transistor. In addition, there is&#xD;
still a great deal of confusion about the relation between defects and the instability&#xD;
induced by stress. The main purpose of this study is to elucidate the relation between&#xD;
the threshold voltage shift (instability) and the defects created by stress. For this&#xD;
purpose a detailed numerical simulation was carried out to investigate the relation&#xD;
between the different types of defects created by stress and the induced instability in&#xD;
a-IGZO TFT. It was found that tail, deep and interface states cause a shift in threshold&#xD;
voltage. Negative and positive shifts are observed if the defects are donor-like and&#xD;
acceptor-like defects, respectively. On the other hand, a hump in the transfer&#xD;
characteristics is induced if discrete interface levels are dominant.</summary>
    <dc:date>2016-03-03T00:00:00Z</dc:date>
  </entry>
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