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http://archives.univ-biskra.dz/handle/123456789/7356
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DC Field | Value | Language |
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dc.contributor.author | M.L. MEGHERBI | - |
dc.contributor.author | L. DEHIMI | - |
dc.contributor.author | A.SAADOUNE | - |
dc.contributor.author | W. TERGHINI | - |
dc.contributor.author | F. PEZZIMENTI | - |
dc.contributor.author | F.G. DELLA CORTE | - |
dc.date.accessioned | 2016-03-03T10:06:46Z | - |
dc.date.available | 2016-03-03T10:06:46Z | - |
dc.date.issued | 2016-03-03 | - |
dc.identifier.uri | http://archives.univ-biskra.dz/handle/123456789/7356 | - |
dc.description.abstract | ABSTRACT In this work,theforward current-voltagecharacteristics of n-type Al implanted 4H-SiC pin diodeshave been investigated experimentally and by mean of numerical simulations in the 298-378K temperature range. Our simulations were performed using proprietary simulations software. The model parameters to be calibrated in the simulation are the electron and hole minority carriers lifetimes.The measured forward I-V characteristics showed two differentbehaviour, the leaky behaved and well behaved diode. The later diodes were considered for simulation comparison.Employing temperature-dependent carrier lifetimes as a fitting parameter, the simulation indicates that drift layer and bulk carrier lifetime ranging from 10ns to 50ns. We achieved a good agreement between simulations and measured data. The measured and the simulated forward characteristics indicate an ideality factor of about1.3for the region 2.5V-2.78Vand 2.14 in the low injection region. Activation energies of about 1.61eV and 2.51eVare obtained respectively which are in good agreement with the expected values. | en_US |
dc.language.iso | en | en_US |
dc.subject | KEYWORDS: p-i-n diode, silicon carbide, silvaco, device simulation, lifetimes. | en_US |
dc.title | ELECTRICAL CHARACTERIZATION OF THE FORWARD CURRENT- VOLTAGE OF AL IMPLANTED 4H-SIC PIN DIODES | en_US |
dc.type | Article | en_US |
Appears in Collections: | Publications Nationales |
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