Tin dioxide SnO2 thin films deposited by ultrasonic spray technique:Properties and Applications

Abstract

In this work, we have prepared tin dioxide thin films SnO2 onto glass substrates, using ultrasonic spray technique. Firstly, the flow rate has been changed from 50 to 175ml/h in order to shows the best values for use it in all the study. For enhance the properties of the pure SnO2, the films were doped with titanium Ti: SnO2 and fluorine (F: SnO2) then after we shows the best values of each one to prepare Ti-F: Co-doping. Many characterizations techniques had done to explore the properties of all the films. The XRD shows that the tetragonal structure remains the same with good crystallization. The poly crystalline structure represents favorable orientation (110) with some films and (200) with the others. While UV-visible results showed transmittance up to 86% approximately and high electrical conductivity up to 10.102 (Ω.cm)-1. The Ti-SnO2 doping represented the smallest thickens 600 nm approximately with high transparency and conductivity that make them good candidate for optoelectronic applications. The SEM study represent big homogenous with good structure better than the pure SnO2 with changed with the dopant. More that the doped films represented optical band gap between 3.6 to 4 eV approximately.